Difference between revisions of "Silicon Wafer (P-type) SiO2"
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==Description== | ==Description== | ||
| − | The '''silicon wafer (P-type) SiO<sub>2</sub>''' can be made from s [[Silicon Wafer (P-type)|silicon safer (P-type)]] using the [[O2 Furnace|O<sub>2</sub> furnace]]. | + | The '''silicon wafer (P-type) SiO<sub>2</sub>''' can be made from s [[Silicon Wafer (P-type)|silicon safer (P-type)]] using the [[O2 Furnace|O<sub>2</sub> furnace]]. The SiO<sub>2</sub> layer, also called di-eletric layer, is isolating, functioning as a barrier for electrons [https://en.wikipedia.org/wiki/Dielectric]. |
Revision as of 21:50, 18 April 2024
Description
The silicon wafer (P-type) SiO2 can be made from s silicon safer (P-type) using the O2 furnace. The SiO2 layer, also called di-eletric layer, is isolating, functioning as a barrier for electrons [1].
Properties
| Name | Value |
|---|---|
| Release Version | 1.3.2 |
Recipes
Annealing Furnace
| Outputs | Components | Recipe |
|---|---|---|
  1  |
O2 Furnace
| Outputs | Components | Recipe |
|---|---|---|
1 |