Silicon Wafer (P-type)
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Description
The Silicon Wafer (P-type) can be made by annealing the unannealed silicon safer (P-type) in the annealing furnace.
P-type silicon is formed when group III elements such as boron, indium, or gallium are used as doping agents. The addition of these elements results in an excess of positive charge carriers in the silicon, known as "holes." The term "P" in "P-type" stands for “positive” [1].
Properties
| Name | Value |
|---|---|
| Release Version | 1.3.2 |
Recipes
Annealing Furnace
| Outputs | Components | Recipe |
|---|---|---|
  1  |
O2 Furnace
| Outputs | Components | Recipe |
|---|---|---|
1 |