Difference between revisions of "Silicon Wafer (N-type)"
Jump to navigation
Jump to search
(3 intermediate revisions by one other user not shown) | |||
Line 1: | Line 1: | ||
==Description== | ==Description== | ||
− | The ''' | + | The '''silicon wafer (N-type)''' can be made by annealing the [[Silicon Wafer (N-type) Unannealed|unannealed silicon safer (N-type)]] using the [[Annealing Furnace|annealing furnace]]. |
+ | N-type silicon is formed when group V elements such as phosphorus, arsenic, or antimony are used as doping agent. This gives the silicon an abundance of negative charge carriers known as “electrons”. The term “N” in "N-type" stands for “negative” [https://waferpro.com/what-are-p-type-and-n-type-silicon-wafers/]. | ||
==Properties== | ==Properties== |
Latest revision as of 03:58, 19 April 2024
Description
The silicon wafer (N-type) can be made by annealing the unannealed silicon safer (N-type) using the annealing furnace.
N-type silicon is formed when group V elements such as phosphorus, arsenic, or antimony are used as doping agent. This gives the silicon an abundance of negative charge carriers known as “electrons”. The term “N” in "N-type" stands for “negative” [1].
Properties
Name | Value |
---|---|
Release Version | 1.3.2 |
Recipes
Annealing Furnace
Outputs | Components | Recipe |
---|---|---|
O2 Furnace
Outputs | Components | Recipe |
---|---|---|