Silicon Wafer fabrication
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Description
These are the instructions to the creation of silicon wafers and their initial processing steps.
Recipes
The starting point for the silicon wafers is a sand, quartz or a mineral rich in silica.
- Step 1.0 Get some sand, quartz or a mineral rich in silica.
- Step 1.1 Purify the sand, quartz ou silica rich mineral in to silica sand in the crafting table.
Recipes
Crafting Table
Outputs | Components | Recipe |
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- Step 1.2 Use nine silica sand in the Furnace to create a silicon ingot.
Furnace
Outputs | Components | Recipe |
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- Step 1.2 Use the Silicon Wafer Ctrl 1.1, Mask (Ctrl 1st well) and a UV bulb in the Contact Printer to imprint the pattern and obtain the Silicon Wafer Ctrl 1.2.
Contact Printer
Outputs | Components | Recipe |
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- Step 1.3 Use the Silicon Wafer Ctrl 1.2 and Vial (Ammonium Fluoride Etchant) in the Chemical Processor to etch the 1st wells and obtain Silicon Wafer Ctrl 1.3.
Chemical Processor
Outputs | Components | Recipe |
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- Step 1.4 Use the Silicon Wafer Ctrl 1.3 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain Silicon Wafer Ctrl 1.4.
Chemical Processor
Outputs | Components | Recipe |
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- Step 1.5 Use the Silicon Wafer Ctrl 1.4 in the Wafer Washer to clean the wafer of photoresist residues and obtain Silicon Wafer Ctrl 1.5.
Wafer Washer
Outputs | Components | Recipe |
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- Step 1.6 Use the Silicon Wafer Ctrl 1.5, a bag of boron and Mask (Ctrl 1st well) in the Ion Bean to seed the 1st well with ions and obtain Silicon Wafer Ctrl 1.6.
Ion Beam
Outputs | Components | Recipe |
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- Step 1.7 Use the Silicon Wafer Ctrl 1.6 and an Oxygen Cartridge in the O2 furnace to grow a SiO2 layer in the wafer and obtain Wafer Ctrl 1.7.
O2 Furnace
Outputs | Components | Recipe |
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- Step 1.8 Use the Silicon Wafer Ctrl 1.7 in the scanning electron microscope to check if the 1st well was correctly created and obtain Wafer Ctrl 1.8.
O2 Furnace
Outputs | Components | Recipe |
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- Step 2.0 Get the Mask (Ctrl 2nd well) from the Mask Writer..
Mask Writer
Outputs | Components | Recipe |
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- Step 2.1 Use the Silicon Wafer Ctrl 1.8 and a Vial (Positive Photoresist) in the Chemical Solution Deposition machine to obtain the Silicon Wafer Ctrl 2.1.
Contact Printer
Outputs | Components | Recipe |
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- Step 2.2 Use the Silicon Wafer Ctrl 2.1, Mask (Ctrl 2nd well) and a UV bulb in the Contact Printer to imprint the etching pattern and obtain the Silicon Wafer Ctrl 2.3.
Contact Printer
Outputs | Components | Recipe |
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- Step 2.3 Use the Silicon Wafer Ctrl 2.2 and Vial (Ammonium Fluoride Etchant) in the Chemical Processor to etch the 2nd wells and obtain Silicon Wafer Ctrl 2.3.
Chemical Processor
Outputs | Components | Recipe |
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- Step 2.4 Use the Silicon Wafer Ctrl 2.3 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain Silicon Wafer Ctrl 2.4.
Chemical Processor
Outputs | Components | Recipe |
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- Step 2.5 Use the Silicon Wafer Ctrl 2.4 in the Wafer Washer to clean the wafer of photoresist residues and obtain Silicon Wafer Ctrl 2.5.
Wafer Washer
Outputs | Components | Recipe |
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- Step 2.6 Use the Silicon Wafer Ctrl 2.5, a bag of phosphorus and Mask (Ctrl 2nd well) in the Ion Bean to seed the 2nd well with ions and obtain Silicon Wafer Ctrl 2.6.
Ion Beam
Outputs | Components | Recipe |
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- Step 2.7 Use the Silicon Wafer Ctrl 2.6 and an Oxygen Cartridge in the O2 furnace to grow a SiO2 layer in the wafer and obtain Wafer Ctrl 2.7.
O2 Furnace
Outputs | Components | Recipe |
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- Step 2.8 Use the Silicon Wafer Ctrl 2.7 in the scanning electron microscope to check if the 2st well was correctly created and obtain Wafer Ctrl 2.8.
O2 Furnace
Outputs | Components | Recipe |
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- Step 3.0 Get the Mask (Ctrl Metal) from the Mask Writer..
Mask Writer
Outputs | Components | Recipe |
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- Step 3.1 Use the Silicon Wafer Ctrl 2.8, Mask (Ctrl Metal) and a Vial (Positive Photoresist) in the Chemical Solution Deposition machine to obtain the Silicon Wafer Ctrl 3.1.
Contact Printer
Outputs | Components | Recipe |
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- Step 3.2 Use the Silicon Wafer Ctrl 3.1, Mask (Ctrl Metal), Vial (Positive Photoresist) and a UV bulb in the Contact Printer to imprint the etching pattern and obtain the Silicon Wafer Ctrl 3.2.
Contact Printer
Outputs | Components | Recipe |
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- Step 3.3 Use the Silicon Wafer Ctrl 3.2 and Vial (Ammonium Fluoride Etchant) in the Chemical Processor to etch the metal contacts and obtain Silicon Wafer Ctrl 3.3.
Chemical Processor
Outputs | Components | Recipe |
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- Step 3.4 Use the Silicon Wafer Ctrl 3.3 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain Silicon Wafer Ctrl 3.4.
Chemical Processor
Outputs | Components | Recipe |
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- Step 3.5 Use the Silicon Wafer Ctrl 3.4 in the wafer washer to clean the wafer of photoresist residues and obtain Silicon Wafer Ctrl 3.5.
Wafer Washer
Outputs | Components | Recipe |
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- Step 3.6 Use the Silicon Wafer Ctrl 3.5 and a copper nugget for Atomic Layer Deposition to create a copper layer in the wafer and obtain Silicon Wafer Ctrl 3.6.
Atomic Layer Deposition
Outputs | Components | Recipe |
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- Step 3.7 Use the Silicon Wafer Ctrl 3.6 in the chemical phisical polisher to strip the excess of metal and obtain a Unwashed Controller Die Wafer.
Wafer Washer
Outputs | Components | Recipe |
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- Step 3.8 Use the Unwashed Controller Die Wafer in the Wafer Washer to clean the wafer of photoresist residues and obtain the Controller Die Wafer.
Wafer Washer
Outputs | Components | Recipe |
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- Step 3.9 Use the Controller Die Wafer in the Stone Cutter to obtain the Controller Die.
Stonecutter
Outputs | Components | Recipe |
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- Create the controller chip - Use a Controller Die, the Enclosure and the Interconnection Array in the Crafting Table to obtain the controller chip.
Crafting Table
Outputs | Components | Recipe |
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History
Semiconductor module 1.0