Difference between revisions of "Silicon Wafer fabrication"
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− | ; Step 1.1 Purify the sand, quartz | + | ; Step 1.1 Purify the sand, quartz or silica rich mineral into silica sand in the crafting table. |
==Recipes== | ==Recipes== | ||
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− | ; Step 1.4 Use a [[Block Of Silicon|silicon block]] in the [[Furnace|furnace]] to obtain | + | ; Step 1.4 Use a [[Block Of Silicon|silicon block]] in the [[Furnace|furnace]] to obtain a [[Silicon Boule|silicon boule]] . |
===Furnace=== | ===Furnace=== | ||
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− | ; Step 1.5 Use a [[Silicon Boule|silicon boule]] in the [[Stonecutter|stonecutter]] to obtain twenty five [[Unpolished Silicon Wafer|unpolished silicon wafers]]. | + | ; Step 1.5 Use a [[Silicon Boule|silicon boule]] in the [[Stonecutter|stonecutter]] to obtain twenty-five [[Unpolished Silicon Wafer|unpolished silicon wafers]]. |
===Stonecutter=== | ===Stonecutter=== | ||
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− | ; Step 1.7 In this step, we will bombard the wafer with ions to insert them | + | ; Step 1.7 In this step, we will bombard the wafer with ions to insert them into the silicon. Take the [[Silicon Wafer|silicon wafers]] to the [[Ion Implanter|ion implanter]] for doping. You have two choices: you can create a P-type wafer using [[Bag (Boron)|boron]] or [[Bag (Indium)|indium]] or you can create N-type wafers using [[Bag (Phosphorus)|phosphorus]], [[Bag (Arsenic)|arsenic]] or [[Bag (Antimony)|antimony]]. To determine which to choose, check the bottom of this page for their applications. |
===Ion Implanter=== | ===Ion Implanter=== | ||
{| class="wikitable sortable collapsible" | {| class="wikitable sortable collapsible" | ||
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− | ; Step 1.8 The implantation process | + | ; Step 1.8 The implantation process disrupted the silicon crystal structure. To smooth and repair the silicon crystal, take the doped [[Silicon Wafer|silicon wafers]] to the [[Annealing Furnace|annealing furnace]] with an [[Cartridge (Argon)|argon cartridge]]. |
===Annealing Furnace=== | ===Annealing Furnace=== | ||
{| class="wikitable sortable collapsible" | {| class="wikitable sortable collapsible" | ||
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− | ; Step 1.9 To grow a layer of silicon dioxide take the doped and annealed [[Silicon Wafer|silicon wafers]] to the [[O2 Furnace|oxygen furnace]] with | + | ; Step 1.9 To grow a layer of silicon dioxide take the doped and annealed [[Silicon Wafer|silicon wafers]] to the [[O2 Furnace|oxygen furnace]] with an [[Cartridge (Oxygen)|oxygen cartridge]]. The dielectric layer of silicon dioxide is an insulator; it will prevent electrons from passing through. |
===O2 Furnace=== | ===O2 Furnace=== | ||
{| class="wikitable sortable collapsible" | {| class="wikitable sortable collapsible" |
Revision as of 18:14, 10 June 2024
Description
These are the instructions for creating silicon wafers and their initial processing steps.
Recipes
The starting point for the silicon wafers is sand, quartz or a mineral rich in silica.
- Step 1.0 Get some sand, quartz or a mineral rich in silica.
- Step 1.1 Purify the sand, quartz or silica rich mineral into silica sand in the crafting table.
Recipes
Crafting Table
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.2 Use nine silica sand portions in the furnace to create a silicon ingot.
Furnace
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.3 Use nine silicon ingots in the crafting table to obtain a silicon block .
Crafting Table
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.4 Use a silicon block in the furnace to obtain a silicon boule .
Furnace
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.5 Use a silicon boule in the stonecutter to obtain twenty-five unpolished silicon wafers.
Stonecutter
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.6 Polish the unpolished silicon wafers in the chemical mechanical polisher.
Chemical Mechanical Polisher
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.7 In this step, we will bombard the wafer with ions to insert them into the silicon. Take the silicon wafers to the ion implanter for doping. You have two choices
- you can create a P-type wafer using boron or indium or you can create N-type wafers using phosphorus, arsenic or antimony. To determine which to choose, check the bottom of this page for their applications.
Ion Implanter
Outputs | Components | Recipe | Do you want to know more? |
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- Step 1.8 The implantation process disrupted the silicon crystal structure. To smooth and repair the silicon crystal, take the doped silicon wafers to the annealing furnace with an argon cartridge.
Annealing Furnace
Outputs | Components | Recipe | Do you want to know more? |
---|---|---|---|
- Step 1.9 To grow a layer of silicon dioxide take the doped and annealed silicon wafers to the oxygen furnace with an oxygen cartridge. The dielectric layer of silicon dioxide is an insulator; it will prevent electrons from passing through.
O2 Furnace
Outputs | Components | Recipe | Do you want to know more? |
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You now have a Silicon wafer (P-type) SiO2 or a Silicon wafer (N-type) SiO2. These are the starting components of semiconductor fabrication that fabs use. The Silicon wafer (P-type) SiO2 can be used to create not-and logic gates (NANDs) or arithmetic logical units (ALUs). The Silicon wafer (N-type) SiO2 can be used to create the controller chip.
History
Semiconductor module 1.0
Links to learn more
Semiconductor fabrication 101 online course from Purdue University (MOC)
Semiconductor manufacturing from Duane Boning at MIT (Course materials)
Certification
Semiconductor fabrication 101 online course from Purdue University (MOC)
References
Semiconductor fabrication 101 online course from Purdue University (MOC)
The Amazing, Humble Silicon Wafer Video from Asianometry (Youtube video)