Difference between revisions of "Silicon Wafer fabrication"
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− | ; Step 1.1 Purify the sand, quartz or silica rich mineral into silica sand in the crafting table. | + | ; Step 1.1 Purify the sand, quartz or silica rich mineral into silica sand in the [[Crafting Table|crafting table]]. |
===Crafting Table=== | ===Crafting Table=== |
Revision as of 00:59, 15 June 2024
Description
These are the instructions for creating silicon wafers and their initial processing steps.
Recipes
The starting point for the silicon wafers is sand, quartz or a mineral rich in silica.
- Step 1.0 Get some sand, quartz or a mineral rich in silica.
- Step 1.1 Purify the sand, quartz or silica rich mineral into silica sand in the crafting table.
Crafting Table
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- Step 1.2 Use nine silica sand portions in the furnace to create a silicon ingot.
Furnace
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- Step 1.3 Use nine silicon ingots in the crafting table to obtain a silicon block .
Crafting Table
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- Step 1.4 Use a silicon block in the furnace to obtain a silicon boule .
Furnace
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- Step 1.5 Use a silicon boule in the stonecutter to obtain twenty-five unpolished silicon wafers.
Stonecutter
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- Step 1.6 Polish the unpolished silicon wafers in the chemical mechanical polisher.
Chemical Mechanical Polisher
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- Step 1.7 In this step, we will bombard the wafer with ions to insert them into the silicon. Take the silicon wafers to the ion implanter for doping. You have two options. You can create a P-type wafer using boron or indium or you can create N-type wafers using phosphorus, arsenic or antimony. To determine which to choose, check the bottom of this page for their applications.
Ion Implanter
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- Step 1.8 The implantation process disrupted the silicon crystal structure. To smooth and repair the silicon crystal, take the doped silicon wafers to the annealing furnace with an argon cartridge.
Annealing Furnace
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- Step 1.9 To grow a layer of silicon dioxide take the doped and annealed silicon wafers to the oxygen furnace with an oxygen cartridge. The dielectric layer of silicon dioxide is an insulator; it will prevent electrons from passing through.
O2 Furnace
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You now have a Silicon Wafer (P-type) SiO2 or a Silicon Wafer (N-type) SiO2. These are the starting components of semiconductor fabrication that fabs use. The Silicon Wafer (P-type) SiO2 can be used to create not-and logic gates (NANDs) or arithmetic logical units (ALUs). The Silicon Wafer (N-type) SiO2 can be used to create the controller chip.
History
Semiconductor module 1.0
Links to learn more
Semiconductor fabrication 101 online course from Purdue University (MOC)
Semiconductor manufacturing from Duane Boning at MIT (Course materials)
Certification
Semiconductor fabrication 101 online course from Purdue University (MOC)
References
Semiconductor fabrication 101 online course from Purdue University (MOC)
The Amazing, Humble Silicon Wafer Video from Asianometry (Youtube video)