Difference between revisions of "Test"
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==Description== | ==Description== | ||
The idea behind the [[controller| microcontroller]] unit is that it is cost-effective, energy-efficient processor that can be purpose-built for a specific application. But some of these devices also have become much more capable over the past few years, blurring the definition of exactly what is a [[controller| microcontroller]]. | The idea behind the [[controller| microcontroller]] unit is that it is cost-effective, energy-efficient processor that can be purpose-built for a specific application. But some of these devices also have become much more capable over the past few years, blurring the definition of exactly what is a [[controller| microcontroller]]. | ||
− | An [[controller chip]] is used as a component in several devices including [[Metal Detector]]s, [[ | + | An [[controller chip]] is used as a component in several devices including [[Metal Detector]]s, [[Wearable]]s, [[SSD]]s and [[CPU]]s. |
==Recipes== | ==Recipes== | ||
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The starting point for the [[Controller chip|controller chip]] is a n-type silicon wafer with a SiO2 layer. | The starting point for the [[Controller chip|controller chip]] is a n-type silicon wafer with a SiO2 layer. | ||
− | ;Step 1.1 Get the [[Controller|Mask ( | + | ;Step 1.1 Get the [[Controller|Mask (Ctrl 1st well)]] from the [[Mask Writer|Mask Writer]]. |
===Mask Writer=== | ===Mask Writer=== | ||
{| class="wikitable sortable collapsible" | {| class="wikitable sortable collapsible" | ||
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|- | |- | ||
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− | * [[Image:silicon_wafer.png|link= | + | * [[Image:silicon_wafer.png|link=Silicon Wafer Ctrl 1|32px|alt=Silicon Wafer Ctrl 1]|[[Silicon Wafer Ctrl 1|Silicon Wafer Ctrl 1]]]] [[Silicon Wafer Ctrl 1|Silicon Wafer Ctrl 1]] |
| | | | ||
* [[365 nm UV Bulbs]] | * [[365 nm UV Bulbs]] | ||
* [[Mask (Ctrl 1st well)]] | * [[Mask (Ctrl 1st well)]] | ||
* [[Vial (Positive Photoresist)]] | * [[Vial (Positive Photoresist)]] | ||
− | * [[ | + | * [[Silicon Wafer (N-type) SiO2]] |
| {{Inventory| | | {{Inventory| | ||
{{Inventory/Slot|index=0|title=365 nm UV Bulbs|image=365_nm_uv_bulbs.png|link=365 nm UV Bulbs}} | {{Inventory/Slot|index=0|title=365 nm UV Bulbs|image=365_nm_uv_bulbs.png|link=365 nm UV Bulbs}} | ||
{{Inventory/Slot|index=2|title=Mask (Ctrl 1st well)|image=Itemmask.png|link=Mask (Ctrl 1st well)}} | {{Inventory/Slot|index=2|title=Mask (Ctrl 1st well)|image=Itemmask.png|link=Mask (Ctrl 1st well)}} | ||
{{Inventory/Slot|index=1|title=Vial (Positive Photoresist)|image=Vessel_vial.png|link=Vial (Positive Photoresist)}} | {{Inventory/Slot|index=1|title=Vial (Positive Photoresist)|image=Vessel_vial.png|link=Vial (Positive Photoresist)}} | ||
− | {{Inventory/Slot|index=3|title= | + | {{Inventory/Slot|index=3|title=Silicon Wafer (N-type) SiO2|image=Waferitem.png|link=Silicon Wafer (N-type) SiO2}} |
− | {{Inventory/Slot|index=5|title= | + | {{Inventory/Slot|index=5|title=Silicon Wafer Ctrl 1|image=Waferitem.png|link=v}} |
{{Inventory/Slot|index=7|title=Fuel|image=Fuel.png|link=List of Fuels}} | {{Inventory/Slot|index=7|title=Fuel|image=Fuel.png|link=List of Fuels}} | ||
|type=contact-printer|shapeless=false}} | |type=contact-printer|shapeless=false}} | ||
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− | * [[Image:silicon_wafer.png|link= | + | * [[Image:silicon_wafer.png|link=Silicon Wafer Ctrl 2|32px|alt=Silicon Wafer Ctrl 2|[[Silicon Wafer Ctrl 2|Silicon Wafer Ctrl 2]]]] [[Silicon Wafer Ctrl 2|Silicon Wafer Ctrl 2]] |
| | | | ||
− | * [[ | + | * [[Silicon Wafer Ctrl 1]] |
* [[Vial (Ammonium Fluoride Etchant)]] | * [[Vial (Ammonium Fluoride Etchant)]] | ||
| {{Inventory| | | {{Inventory| | ||
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− | ; Step 1.4 Use the silicon wafer Ctrl 2 and Vial (Photoresist Stripper SPM) in the [[Chemical Processor]] to remove the photoresist and obtain | + | ; Step 1.4 Use the silicon wafer Ctrl 2 and Vial (Photoresist Stripper SPM) in the [[Chemical Processor]] to remove the photoresist and obtain Silicon Wafer Ctrl 3. |
===Chemical Processor=== | ===Chemical Processor=== |
Revision as of 18:34, 16 April 2024
Description
The idea behind the microcontroller unit is that it is cost-effective, energy-efficient processor that can be purpose-built for a specific application. But some of these devices also have become much more capable over the past few years, blurring the definition of exactly what is a microcontroller. An controller chip is used as a component in several devices including Metal Detectors, Wearables, SSDs and CPUs.
Recipes
The starting point for the controller chip is a n-type silicon wafer with a SiO2 layer.
- Step 1.1 Get the Mask (Ctrl 1st well) from the Mask Writer.
Mask Writer
Outputs | Components | Recipe |
---|---|---|
- Step 1.2 Use the silicon wafer (N-type) SiO2, Mask (Ctrl 1st well), Vial (Positive Photoresist) and a UV bulb in the Contact Printer to imprint the etching pattern and obtain the silicon wafer Ctrl 1.
Contact Printer
Outputs | Components | Recipe |
---|---|---|
- Step 1.3 Use the silicon wafer Ctrl 1 and Vial (Ammonium Fluoride Etchant) in the Chemical Processor to etch the 1st wells and obtain silicon wafer Ctrl 2.
Chemical Processor
Outputs | Components | Recipe |
---|---|---|
- Step 1.4 Use the silicon wafer Ctrl 2 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain Silicon Wafer Ctrl 3.
Chemical Processor
Outputs | Components | Recipe |
---|---|---|
- Step 1.5 Use the silicon wafer Ctrl 3 in the wafer washer to clean the wafer of photoresist residues and obtain silicon wafer Ctrl 4.
Wafer Washer
Outputs | Components | Recipe |
---|---|---|
- Step 1.6 Use the silicon wafer Ctrl 4, a bag of boron and Mask (ctrl 1st well) in the Ion Bean to seed the 1st well with ions and obtain silicon wafer Ctrl 5.
Ion Beam
Outputs | Components | Recipe |
---|---|---|
- Step 1.7 Use the silicon wafer Ctrl 5 and a oxygen cartridge in the O2 furnace to grow a SiO2 layer in the wafer and obtain wafer Ctrl 6.
- Step 2.1 Get the Mask (Ctrl 2nd well) from the mask writer.
Mask Writer
Outputs | Components | Recipe |
---|---|---|
- Step 2.2 Use the silicon wafer Ctrl 6, Mask (Ctrl 2nd well), Vial (Positive Photoresist) and a UV bulb in the contact printer to imprint the etching pattern and obtain the silicon wafer Ctrl 7.
- Step 2.3 Use the silicon wafer Ctrl 7 and Vial (Ammonium Fluoride Etchant) in the Chemical Processor to etch the 2nd wells and obtain silicon wafer Ctrl 8.
- Step 2.4 Use the silicon wafer Ctrl 8 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain silicon wafer Ctrl 9.
- Step 2.5 Use the silicon wafer Ctrl 9 in the wafer washer to clean the wafer of photoresist residues and obtain silicon wafer Ctrl 10.
- Step 2.6 Use the silicon wafer Ctrl 10, a bag of phosphorus and Mask (Ctrl 2nd well) in the Ion Bean to seed the 2nd well with ions and obtain silicon wafer Ctrl 11.
- Step 3.1 Get the Mask (Ctrl Metal 1) from the mask writer.
Mask Writer
Outputs | Components | Recipe |
---|---|---|
- Step 3.2 Use the silicon wafer Ctrl 11, Mask (ctrl Metal 1), Vial (Positive Photoresist) and a UV bulb in the contact printer to imprint the etching pattern and obtain the silicon wafer Ctrl 12.
- Step 3.3 Use the silicon wafer Ctrl 12 and Vial (Ammonium Fluoride Etchant) in the Chemical Processor to etch the metal contacts and obtain silicon wafer Ctrl 13.
- Step 3.4 Use the silicon wafer Ctrl 13 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain silicon wafer Ctrl 14.
- Step 3.5 Use the silicon wafer Ctrl 14 in the wafer washer to clean the wafer of photoresist residues and obtain silicon wafer Ctrl 15.
- Step 3.6 Use the silicon wafer Ctrl 15, a copper nugget for Atomic Layer Deposition to create a copper layer in the waffer and obtain silicon wafer Ctrl 16.
- Step 4.1 Get the Mask (ctrl Metal 2) from the mask writer.
Mask Writer
Outputs | Components | Recipe |
---|---|---|
- Step 4.2 Use the silicon wafer Ctrl 16, Mask (ctrl Metal 2), Vial (Positive Photoresist) and a UV bulb in the contact printer to imprint the etching pattern and obtain the silicon wafer Ctrl 17.
- Step 4.3 Use the silicon wafer Ctrl 17 and Vial (Copper Etchant) in the Chemical Processor to etch the excess copper and obtain silicon wafer Ctrl 18.
- Step 4.4 Use the silicon wafer Ctrl 18 and Vial (Photoresist Stripper SPM) in the Chemical Processor to remove the photoresist and obtain the unwashed Controller Die Wafer.
- Step 4.5 Use the unwashed Controller Die Wafer in the wafer washer to clean the wafer of photoresist residues and obtain the controller die wafer.
- Step 4.6 Use the controller die wafer in the stone cutter to obtain the controller dies.
- Step 4.7 Use a controller die, the enclosure and the interconnect array in the crafting table to obtain the controller chip.
Crafting Table
Outputs | Components | Recipe |
---|---|---|
History
Semiconductor module 1.0